Multi-technique x-ray and optical characterization of crystalline phase, texture, and electronic structure of atomic layer deposited Hf1−xZrxO2 gate dielectrics deposited by a cyclical deposition and annealing scheme

Relja Vasić, Steven Consiglio, Robert D. Clark, Kandabara Tapily, Shawn Sallis, Bo Chen, David Newby, Manasa Medikonda, Gangadhara Raja Muthinti, Eric Bersch, Jean Jordan-Sweet, Christian Lavoie, Gert J. Leusink, Alain C. Diebold
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4811446
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