The impact of film thickness and substrate surface roughness on the thermal resistance of aluminum nitride nucleation layers

Zonghui Su, Justin P. Freedman, Jacob H. Leach, Edward A. Preble, Robert F. Davis, Jonathan A. Malen
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4808238
The author haven't yet claimed this publicationThe author haven't yet claimed this publication