Characterization of room temperature recrystallization kinetics in electroplated copper thin films with concurrent x-ray diffraction and electrical resistivity measurements

Mikhail Treger, Christian Witt, Cyril Cabral, Conal Murray, Jean Jordan-Sweet, Robert Rosenberg, Eric Eisenbraun, I. C. Noyan
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4807899
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