Electrical characterisation and predictive simulation of defects induced by keV Si+ implantation in n-type Si

Z. Essa, E. Bedel-Pereira, D. Bolze, Y. Yamamoto, C. Nyamhere, F. Cristiano, F. Olivie
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4804332