In situ doped phosphorus diffusion behavior in germanium epilayer on silicon substrate by ultra-high vacuum chemical vapor deposition

Shihao Huang, Cheng Li, Chengzhao Chen, Chen Wang, Guangming Yan, Hongkai Lai, Songyan Chen
  • Applied Physics Letters, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4804204