Bias-voltage application in a hard x-ray photoelectron spectroscopic study of the interface states at oxide/Si(100) interfaces

Yoshiyuki Yamashita, Hideki Yoshikawa, Toyohiro Chikyow, Keisuke Kobayashi
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4803491