The formation of Ti–O tetrahedra and band gap reduction in SiO2 via pulsed ion implantation

E. Z. Kurmaev, N. V. Gavrilov, A. Moewes, R. J. Green, D. A. Zatsepin, A. Hunt
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4795262