Improved Ohmic contacts to plasma etched n-Al0.5Ga0.5N by annealing under nitrogen ambient before metal deposition

Wei Zhang, Jianbao Zhang, Zhihao Wu, Shengchang Chen, Yang Li, Yu Tian, Jiangnan Dai, Changqing Chen, Yanyan Fang
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4794099
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