Atomic layer-by-layer oxidation of Ge (100) and (111) surfaces by plasma post oxidation of Al2O3/Ge structures

  • Rui Zhang, Po-Chin Huang, Ju-Chin Lin, Mitsuru Takenaka, Shinichi Takagi
  • Applied Physics Letters, February 2013, American Institute of Physics
  • DOI: 10.1063/1.4794013

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http://dx.doi.org/10.1063/1.4794013

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