Unveiling the mechanisms of dressed-photon–phonon etching based on hierarchical surface roughness measure

  • Makoto Naruse, Takashi Yatsui, Wataru Nomura, Tadashi Kawazoe, Masaki Aida, Motoichi Ohtsu
  • Applied Physics Letters, February 2013, American Institute of Physics
  • DOI: 10.1063/1.4793233

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http://dx.doi.org/10.1063/1.4793233

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