Unveiling the mechanisms of dressed-photon–phonon etching based on hierarchical surface roughness measure

Makoto Naruse, Takashi Yatsui, Wataru Nomura, Tadashi Kawazoe, Masaki Aida, Motoichi Ohtsu
  • Applied Physics Letters, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4793233