Lattice and grain-boundary diffusions of boron atoms in BaSi2 epitaxial films on Si(111)

K. Nakamura, M. Baba, M. Ajmal Khan, W. Du, M. Sasase, K. O. Hara, N. Usami, K. Toko, T. Suemasu
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4790597
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