Effect of NH3 plasma treatment on the interfacial property between ultrathin HfO2 and strained Si0.65Ge0.35 substrate

T. Yu, C. G. Jin, Y. Yang, L. J. Zhuge, X. M. Wu, Z. F. Wu
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4788907
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