Effect of plasma N2 and thermal NH3 nitridation in HfO2 for ultrathin equivalent oxide thickness

Min Dai, Yanfeng Wang, Joseph Shepard, Jinping Liu, Maryjane Brodsky, Shahab Siddiqui, Paul Ronsheim, Dimitris P Ioannou, Chandra Reddy, William Henson, Siddarth Krishnan, Vijay Narayanan, Michael P Chudzik
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4775817