Effect of residual chips on the material removal process of the bulk metallic glass studied by in situ scratch testing inside the scanning electron microscope

Hu Huang, Hongwei Zhao, Chengli Shi, Boda Wu, Zunqiang Fan, Shunguang Wan, Chunyang Geng
  • AIP Advances, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4774032
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