Surface loss probability of H radicals on silicon thin films in SiH4/H2 plasma

Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4773104

Surface loss probability of H on Si films in SiH4/H2 plasma

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The following have contributed to this page: Dr Kenji Ishikawa