Revisiting the mechanisms involved in Line Width Roughness smoothing of 193 nm photoresist patterns during HBr plasma treatment

M. Brihoum, R. Ramos, K. Menguelti, G. Cunge, E. Pargon, O. Joubert
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4773068