Investigation of carbon interstitials with varied SiO2 thickness in HfO2/SiO2/4H-SiC structure

  • Chia-Ming Hsu, Jenn-Gwo Hwu
  • Applied Physics Letters, December 2012, American Institute of Physics
  • DOI: 10.1063/1.4772986

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http://dx.doi.org/10.1063/1.4772986

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