Improved reliability predictions in high permittivity dielectric oxide capacitors under high dc electric fields with oxygen vacancy induced electromigration

C. A. Randall, R. Maier, W. Qu, K. Kobayashi, K. Morita, Y. Mizuno, N. Inoue, T. Oguni
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4772599
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