A model for phosphosilicate glass deposition via POCl3 for control of phosphorus dose in Si

Renyu Chen, Hannes Wagner, Amir Dastgheib-Shirazi, Michael Kessler, Zihua Zhu, Vaithiyalingam Shutthanandan, Pietro P. Altermatt, Scott T. Dunham
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4771672
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