LaAlO3/Si capacitors: Comparison of different molecular beam deposition conditions and their impact on electrical properties

Sylvain Pelloquin, Guillaume Saint-Girons, Nicolas Baboux, David Albertini, Jose Penuelas, Carole Plossu, Guy Hollinger, Waël Hourani, Geneviève Grenet
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4769890
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The following have contributed to this page: Dr Wael Hourani