Chemical and structural investigations of the incorporation of metal manganese into ruthenium thin films for use as copper diffusion barrier layers

  • A. P. McCoy, P. Casey, J. Bogan, J. G. Lozano, P. D. Nellist, G. Hughes
  • Applied Physics Letters, December 2012, American Institute of Physics
  • DOI: 10.1063/1.4769229

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