Negative effect of crystallization on the mechanism of laser damage in a HfO2/SiO2 multilayer

Ryo Tateno, Hajime Okada, Tomohito Otobe, Keigo Kawase, James K. Koga, Atsushi Kosuge, Keisuke Nagashima, Akira Sugiyama, Kunihiro Kashiwagi
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4767231