Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy

C. Papp, G. Conti, B. Balke, S. Ueda, Y. Yamashita, H. Yoshikawa, Y. S. Uritsky, K. Kobayashi, C. S. Fadley
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4765720
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