Plasma processing of low-k dielectrics

Mikhail R. Baklanov, Jean-Francois de Marneffe, Denis Shamiryan, Adam M. Urbanowicz, Hualiang Shi, Tatyana V. Rakhimova, Huai Huang, Paul S. Ho
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4765297