Temperature-dependent relaxation current on single and dual layer Pt metal nanocrystal-based Al2O3/SiO2 gate stack

Y. N. Chen, K. E. J. Goh, X. Wu, Z. Z. Lwin, P. K. Singh, S. Mahapatra, K. L. Pey
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4764873