Dielectric relaxation study of amorphous TiTaO thin films in a large operating temperature range

A. Rouahi, A. Kahouli, F. Challali, M. P. Besland, C. Vallée, S. Pairis, B. Yangui, S. Salimy, A. Goullet, A. Sylvestre
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4761980