Improved charge-trapping properties of TiON/HfON dual charge storage layer by tapered band structure

  • L. Liu, J. P. Xu, F. Ji, J. X. Chen, P. T. Lai
  • Applied Physics Letters, September 2012, American Institute of Physics
  • DOI: 10.1063/1.4754830

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http://dx.doi.org/10.1063/1.4754830

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