Publisher's Note: “Controlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition” [J. Appl. Phys. 112, 043708 (2012)]

M. V. Ponomarev, M. A. Verheijen, W. Keuning, M. C. M. van de Sanden, M. Creatore
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4754316