Impact of oxygen annealing on high-k gate stack defects characterized by random telegraph noise

  • Hsu Feng Chiu, San Lein Wu, Yee Shyi Chang, Shoou Jinn Chang, Jone Fang Chen, Shih Chang Tsai, Che Hua Hsu, Chien Ming Lai, Chia Wei Hsu, Osbert Cheng
  • Applied Physics Letters, September 2012, American Institute of Physics
  • DOI: 10.1063/1.4753997

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http://dx.doi.org/10.1063/1.4753997

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