Abnormal interface state generation under positive bias stress in TiN/HfO2 p-channel metal-oxide-semiconductor field effect transistors

Wen-Hung Lo, Ting-Chang Chang, Jyun-Yu Tsai, Chih-Hao Dai, Ching-En Chen, Szu-Han Ho, Hua-Mao Chen, Osbert Cheng, Cheng-Tung Huang
  • Applied Physics Letters, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4752456
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