Hydrogen passivation of polycrystalline silicon thin films

L.-P. Scheller, M. Weizman, P. Simon, M. Fehr, N. H. Nickel
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4752268
The author haven't yet claimed this publicationThe author haven't yet claimed this publication