The effect of PECVD plasma decomposition on the wettability and dielectric constant changes in silicon modified DLC films for potential MEMS and low stiction applications

A. A. Ogwu, T. I. T. Okpalugo, J. A. D. McLaughlin
  • AIP Advances, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4742852
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The following have contributed to this page: Prof James J McLaughlin