Probing the intrinsic electrical properties of thin organic layers/semiconductor interfaces using an atomic-layer-deposited Al2O3 protective layer

W. Peng, O. Seitz, R. A. Chapman, E. M. Vogel, Y. J. Chabal
  • Applied Physics Letters, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4742168
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