Process dependence of 1/f noise and defects in ion implanted p-type piezoresistors

Robert Dieme, Jack Zhang, Nicholas G. Rudawski, Kevin Jones, Gijs Bosman, Mark Sheplak, Toshikazu Nishida
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4740221