Eco-friendly electron beam lithography using water-developable resist material derived from biomass

  • Satoshi Takei, Akihiro Oshima, Takanori Wakabayashi, Takahiro Kozawa, Seiichi Tagawa
  • Applied Physics Letters, July 2012, American Institute of Physics
  • DOI: 10.1063/1.4737639

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http://dx.doi.org/10.1063/1.4737639

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