Mechanical and piezoresistive properties of thin silicon films deposited by plasma-enhanced chemical vapor deposition and hot-wire chemical vapor deposition at low substrate temperatures

J. Gaspar, A. Gualdino, B. Lemke, O. Paul, V. Chu, J. P. Conde
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4736548