Crystalline silicon surface passivation by intrinsic silicon thin films deposited by low-frequency inductively coupled plasma

H. P. Zhou, D. Y. Wei, S. Xu, S. Q. Xiao, L. X. Xu, S. Y. Huang, Y. N. Guo, S. Khan, M. Xu
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4733701
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