Structural and electrical properties of atomic layer deposited Al-doped ZrO2 films and of the interface with TaN electrode

S. Spiga, R. Rao, L. Lamagna, C. Wiemer, G. Congedo, A. Lamperti, A. Molle, M. Fanciulli, F. Palma, F. Irrera
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4731746
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