Synergistic etch rates during low-energetic plasma etching of hydrogenated amorphous carbon

T. A. R. Hansen, J. W. Weber, P. G. J. Colsters, D. M. H. G. Mestrom, M. C. M. van de Sanden, R. Engeln
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4730924
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