Fermi level tuning using the Hf-Ni alloy system as a gate electrode in metal-oxide-semiconductor devices

Jonathan Avner Rothschild, Aya Cohen, Anna Brusilovsky, Lior Kornblum, Yaron Kauffmann, Yaron Amouyal, Moshe Eizenberg
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4730618
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