Microstructure analysis of novel ternary NiSi2−xAlx silicide layers on Si(001) formed by solid-state reaction

A. Mogilatenko, G. Beddies, M. Falke, I. Häusler, W. Neumann
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4718008