Study of charge distribution and charge loss in dual-layer metal-nanocrystal-embedded high-κ/SiO2 gate stack

  • Z. Z. Lwin, K. L. Pey, Q. Zhang, M. Bosman, Q. Liu, C. L. Gan, P. K. Singh, S. Mahapatra
  • Applied Physics Letters, May 2012, American Institute of Physics
  • DOI: 10.1063/1.4712565

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http://dx.doi.org/10.1063/1.4712565

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