Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy

L. Azarnouche, E. Pargon, K. Menguelti, M. Fouchier, D. Fuard, P. Gouraud, C. Verove, O. Joubert
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.4705509
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