Mechanism of contact resistance formation in ohmic contacts with high dislocation density

A. V. Sachenko, A. E. Belyaev, N. S. Boltovets, R. V. Konakova, Ya. Ya. Kudryk, S. V. Novitskii, V. N. Sheremet, J. Li, S. A. Vitusevich
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.3702850
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