High temperature x ray diffraction measurements on Ge/Si(001) heterostructures: A study on the residual tensile strain

G. Capellini, M. De Seta, P. Zaumseil, G. Kozlowski, T. Schroeder
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.3702443
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