Characterization of the E(0.31) defect introduced in bulk n-Ge by H or He plasma exposure

C. Nyamhere, A. Venter, F. D. Auret, S. M. M. Coelho, D. M. Murape
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.3687426