In situ crystallization kinetics studies of plasma-deposited, hydrogenated amorphous silicon layers

K. Sharma, M. A. Verheijen, M. C. M. van de Sanden, M. Creatore
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.3681185
The author haven't yet claimed this publicationThe author haven't yet claimed this publication