Densification of chemical vapor deposition silicon dioxide film using oxygen radical oxidation

Kazumasa Kawase, Akinobu Teramoto, Hiroshi Umeda, Tomoyuki Suwa, Yasushi Uehara, Takeo Hattori, Tadahiro Ohmi
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.3679553
The author haven't yet claimed this publicationThe author haven't yet claimed this publication