Negative resistance phenomenon in dual-frequency capacitively coupled plasma-enhanced chemical vapor deposition system for photovoltaic manufacturing process

Aman-ur-Rehman, H. C. Kwon, I. H. Won, W. T. Park, J. K. Lee
  • Journal of Applied Physics, January 2012, American Institute of Physics
  • DOI: 10.1063/1.3679107
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