Surface passivation of Cu(In,Ga)Se2 using atomic layer deposited Al2O3

Y.-Y. Chen, Y.-J. Chien, C. W. Liu, W.-W. Hsu, J. Y. Chen, T.-H. Cheng, S. C. Lu, W.-S. Ho
  • Applied Physics Letters, January 2012, American Institute of Physics
  • DOI: 10.1063/1.3675849
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